Dakota Mace is a professional Diné (Navajo) artist and researcher who focuses on cultural appropriation of Indigenous design-work, material culture, and Indigenous textile history. Mace received her MA and MFA degrees in Photography and Textile Design at the University of Wisconsin–Madison and her BFA in Photography from the Institute of American Indian Arts. Her concentrations have been in design studies, material culture, and Indigenous textile history. She is currently a photographer and lecturer at the University of Wisconsin–Madison. She teaches photography, both digital and film, and continues to develop workshops and lectures that focus on the appropriation and influence of Indigenous design work within fashion and popular culture.
Her work as an artist and researcher has been exhibited nationally and internationally at various conferences and galleries. She has received numerous awards, including the 2020 Fellowship Art Award, 2019 Women Forward Award, Madison Magazine M List 2018 Awardee, Summer Time Academic Research (STAR) Award, and Alice Brown Memorial Scholarship.
Chemigram (Open Series)
4” x 6”